Factory Price Pure polished Tungsten Sputtering Target

Description:
Due to its high melting point, plasticity, low expansion coefficient, resistivity and good thermal stability. Pure tungsten and tungsten alloy targets are widely used for semi-conductor integrated circuit, surface monitor, solar energy photovoltaic and X-ray. Tungsten target can be used with old sputtering equipment, also with the newest technical device such as solar energy battery, fuel battery and large scaled coating for chips.

Tungsten target is produced by sintering tungsten powder. Tungsten target is solid and its surface is bright. We can produce tungsten target as customers’ requirements. Metal tungsten has good ductility. So it can be used for cathode target in X ray tube. This tungsten target owns homogeneous, good thermal conductivity, high melting point, low vapor pressure. So it can be applied to glass, LCD screen, LED and electrical industry.



Tungsten sputtering target has adopted the best technique including X ray fluorescence (XRF), Glow discharge mass spectrometry (GDMS), inductively coupled plasma (ICP). A new way to make material of thin film is sputtering physical vapor deposition (PCD). The thin film made by sputtering material has high density and good adhesion. We produce tungsten sputtering target as customers’ requirements.



Application:
Owing to its high density and hardness, resistant to high temperature, thermal conductivity, the tungsten block is widely used in aviation, military, metallurgy, building materials. It’s mainly made into rocket motor throat liner, X ray generator target, armor warhead, rare earth electrode, glass furnace electrode and so on.
1.Tungsten block could be manufactured as the parts of military defense and extrusion die;
2. In semi-conductor industry, tungsten parts are mainly