Plasma enhanced chemical vapor deposition coating machine

Chemical vapor deposition adopts plasma enhanced chemical vapor deposition technology, which can use high-energy plasma to promote the reaction process, effectively increase the reaction speed and reduce the reaction temperature.

1. Suitable for depositing thin films of silicon nitride, amorphous silicon and microcrystalline silicon on different substrates such as optical glass, silicon, quartz and stainless steel.
2. Good film-forming quality, less pinholes and is not easy to crack. It is suitable for the preparation of amorphous silicon and microcrystalline silicon thin film solar cell devices.
3. Be widely used in the scientific research and small batch preparation of thin film materials in Colleges and universities and scientific research institutes.

How to pay?
L/C,D/A,D/P,T/T,Western Union,MoneyGram,credit card.

How long is your delivery time
1. If the goods are in stock, it is 5-10 days.
2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

How is the package of goods?
Standard export fumigation sign wooden box packaging

Visit our web site for more details" or "Write us for more information and prices"
https://www.cysi.wang/
telephone +86 371 5519 9322
E-mail cysi@cysi.wang
fax +86 371 8603 6875